{"id":7571,"date":"2024-04-08T10:51:43","date_gmt":"2024-04-08T02:51:43","guid":{"rendered":"https:\/\/www.nanofab.com.cn\/?p=7571"},"modified":"2024-05-28T10:14:16","modified_gmt":"2024-05-28T02:14:16","slug":"effect-of-sputtering-coating-on-thin-films","status":"publish","type":"post","link":"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/\u6e85\u5c04\u9540\u819c\/","title":{"rendered":"\u00bfQu\u00e9 factores influyen en el proceso de recubrimiento por pulverizaci\u00f3n cat\u00f3dica de materiales de pel\u00edcula fina?"},"content":{"rendered":"<div data-elementor-type=\"wp-post\" data-elementor-id=\"7571\" class=\"elementor elementor-7571\" data-elementor-post-type=\"post\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-461cc61 elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"461cc61\" data-element_type=\"section\" data-settings=\"{&quot;jet_parallax_layout_list&quot;:[]}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-384b55d\" data-id=\"384b55d\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-inner-section elementor-element elementor-element-13285ed elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"13285ed\" data-element_type=\"section\" data-settings=\"{&quot;jet_parallax_layout_list&quot;:[]}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-no\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-inner-column elementor-element elementor-element-44dd20d\" data-id=\"44dd20d\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-429f062 elementor-widget elementor-widget-heading\" data-id=\"429f062\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 *\/\n.elementor-heading-title{padding:0;margin:0;line-height:1}.elementor-widget-heading .elementor-heading-title[class*=elementor-size-]>a{color:inherit;font-size:inherit;line-height:inherit}.elementor-widget-heading .elementor-heading-title.elementor-size-small{font-size:15px}.elementor-widget-heading .elementor-heading-title.elementor-size-medium{font-size:19px}.elementor-widget-heading .elementor-heading-title.elementor-size-large{font-size:29px}.elementor-widget-heading .elementor-heading-title.elementor-size-xl{font-size:39px}.elementor-widget-heading .elementor-heading-title.elementor-size-xxl{font-size:59px}<\/style><h1 class=\"elementor-heading-title elementor-size-default\">\u00bfQu\u00e9 factores influyen en el proceso de recubrimiento por pulverizaci\u00f3n cat\u00f3dica de materiales de pel\u00edcula fina?<\/h1>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d1ad59a elementor-widget elementor-widget-post-info\" data-id=\"d1ad59a\" data-element_type=\"widget\" data-widget_type=\"post-info.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<link rel=\"stylesheet\" href=\"https:\/\/www.nanofab.com.cn\/wp-content\/plugins\/elementor\/assets\/css\/widget-icon-list.min.css\"><link rel=\"stylesheet\" href=\"https:\/\/www.nanofab.com.cn\/wp-content\/plugins\/elementor-pro\/assets\/css\/widget-theme-elements.min.css\">\t\t<ul class=\"elementor-icon-list-items elementor-post-info\">\n\t\t\t\t\t\t\t\t<li class=\"elementor-icon-list-item elementor-repeater-item-577f4c4\" itemprop=\"datePublished\">\n\t\t\t\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/es\/2024\/04\/08\/\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t<span class=\"elementor-icon-list-text elementor-post-info__item elementor-post-info__item--type-date\">\n\t\t\t\t\t\t\t\t\t\t<time>2024-04-08<\/time>\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t<\/a>\n\t\t\t\t<\/li>\n\t\t\t\t<\/ul>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c73d98a elementor-widget elementor-widget-image\" data-id=\"c73d98a\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 *\/\n.elementor-widget-image{text-align:center}.elementor-widget-image a{display:inline-block}.elementor-widget-image a img[src$=\".svg\"]{width:48px}.elementor-widget-image img{vertical-align:middle;display:inline-block}<\/style>\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3-1024x768.png\" class=\"attachment-large size-large wp-image-7572\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3-1024x768.png 1024w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3-300x225.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3-768x576.png 768w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3-1536x1152.png 1536w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3-16x12.png 16w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/d4bd772da2d2f10b5d0b7af283bfaf3.png 1920w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1b88541 elementor-widget elementor-widget-text-editor\" data-id=\"1b88541\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 *\/\n.elementor-widget-text-editor.elementor-drop-cap-view-stacked .elementor-drop-cap{background-color:#69727d;color:#fff}.elementor-widget-text-editor.elementor-drop-cap-view-framed .elementor-drop-cap{color:#69727d;border:3px solid;background-color:transparent}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap{margin-top:8px}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap-letter{width:1em;height:1em}.elementor-widget-text-editor .elementor-drop-cap{float:left;text-align:center;line-height:1;font-size:50px}.elementor-widget-text-editor .elementor-drop-cap-letter{display:inline-block}<\/style>\t\t\t\t<p>Con part\u00edculas de alta energ\u00eda (por lo general por el campo el\u00e9ctrico acelerado iones positivos) bombardeo de la superficie s\u00f3lida, la superficie s\u00f3lida de los \u00e1tomos, mol\u00e9culas y las part\u00edculas incidentes de alta energ\u00eda para el intercambio de energ\u00eda cin\u00e9tica de la superficie s\u00f3lida salpican fuera del fen\u00f3meno conocido como pulverizaci\u00f3n cat\u00f3dica. Los \u00e1tomos pulverizados (o grupos at\u00f3micos) tienen una cierta energ\u00eda, pueden volver a depositar cohesi\u00f3n en la superficie del sustrato s\u00f3lido para formar una pel\u00edcula delgada, conocida como recubrimiento de pulverizaci\u00f3n cat\u00f3dica.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-5ba7830 elementor-widget elementor-widget-heading\" data-id=\"5ba7830\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Sputtering con materiales de pel\u00edcula fina<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-989d7db elementor-widget elementor-widget-text-editor\" data-id=\"989d7db\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Las propiedades macrosc\u00f3picas de los materiales est\u00e1n estrechamente relacionadas con su microestructura, por lo que es especialmente importante utilizar m\u00e9todos econ\u00f3micos y eficaces para modificar la estructura organizativa del material, impartiendo as\u00ed nuevas propiedades compuestas a la superficie del material. En las primeras fases de la preparaci\u00f3n de materiales de capa fina mediante deposici\u00f3n por pulverizaci\u00f3n cat\u00f3dica, los factores que influyen son la calidad de la fuente de pulverizaci\u00f3n cat\u00f3dica, la energ\u00eda y la distribuci\u00f3n angular de los \u00e1tomos pulverizados, as\u00ed como el rendimiento y la tasa de pulverizaci\u00f3n cat\u00f3dica. En las fases posteriores del proceso de preparaci\u00f3n, factores como el gas de pulverizaci\u00f3n cat\u00f3dica, la tensi\u00f3n de pulverizaci\u00f3n cat\u00f3dica y la tensi\u00f3n del sustrato, la temperatura del sustrato, la calidad del blanco, el vac\u00edo y la presi\u00f3n del aire de trabajo de pulverizaci\u00f3n cat\u00f3dica son los principales factores que influyen en la composici\u00f3n y organizaci\u00f3n de la pel\u00edcula fina. Al tiempo que se garantiza la estabilidad de la organizaci\u00f3n del material de la pel\u00edcula fina, la homogeneidad y la pureza tambi\u00e9n son indicadores importantes que deben tenerse en cuenta, ya que son cruciales para la selecci\u00f3n y la mejora de las distintas tecnolog\u00edas de recubrimiento por sputtering.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bd24daf elementor-widget elementor-widget-heading\" data-id=\"bd24daf\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Efectos del sputtering y de los materiales<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-226a0e0 elementor-widget elementor-widget-text-editor\" data-id=\"226a0e0\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p><strong>1. Pulverizaci\u00f3n cat\u00f3dica de metales y semiconductores<\/strong><\/p><p>sputtering secundario, sputtering terciario y<a href=\"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/que-es-el-magnetron-sputtering-2\/\">pulverizaci\u00f3n cat\u00f3dica por magnetr\u00f3n<\/a>Estos m\u00e9todos comunes de pulverizaci\u00f3n cat\u00f3dica se distinguen principalmente por la estructura del electrodo.<\/p><p>El sputtering secundario de corriente continua ordinario consiste en aplicar un potencial negativo de corriente continua directamente al blanco de sputtering y colocar el armaz\u00f3n del sustrato de la pieza recubierta como \u00e1nodo. Los \u00e1tomos del material objetivo se pulverizan desde el c\u00e1todo y se depositan en la superficie del sustrato para formar una fina pel\u00edcula. En el proceso de pulverizaci\u00f3n cat\u00f3dica, la descarga de Ar se encuentra en un estado de descarga luminosa anormal, y el resplandor de la descarga cubre toda la superficie del c\u00e1todo objetivo, haciendo que la pulverizaci\u00f3n cat\u00f3dica del objetivo y la formaci\u00f3n de la pel\u00edcula superficial del sustrato sean uniformes. En el estado de descarga luminosa anormal, la velocidad de deposici\u00f3n puede modificarse ajustando la tensi\u00f3n de pulverizaci\u00f3n cat\u00f3dica y cambiando la corriente de pulverizaci\u00f3n cat\u00f3dica. La ventaja del sputtering secundario DC es que el dispositivo es sencillo y adecuado para el sputtering de blancos met\u00e1licos y semiconductores. Sin embargo, la tasa de deposici\u00f3n es baja cuando se pulveriza; debido a la alta tensi\u00f3n de descarga directa, el sustrato es muy f\u00e1cil de da\u00f1ar el aumento de la temperatura; la selecci\u00f3n de las condiciones de presi\u00f3n de aire son duras, la descarga a baja presi\u00f3n no se puede mantener, la calidad de la pel\u00edcula depositada por alta presi\u00f3n es pobre; la pulverizaci\u00f3n de materiales aislantes no es aplicable.<\/p><p>El sputtering terciario de CC consiste en la introducci\u00f3n de un c\u00e1todo y un \u00e1nodo de filamento caliente en un dispositivo de sputtering secundario, con el c\u00e1todo de filamento conectado a tierra y el \u00e1nodo a 50-100 V. El filamento emite electrones a altas temperaturas, que son acelerados por un campo el\u00e9ctrico, y luego colisionan y se ionizan con los \u00e1tomos de Ar durante su movimiento hacia el \u00e1nodo para crear una descarga de arco de c\u00e1todo caliente no autosostenida. El sputtering en tres etapas puede aumentar la corriente de descarga, puede controlar completamente la corriente y la carga de iones de forma independiente, y puede mantener la descarga a bajo voltaje, lo que es superior en comparaci\u00f3n con el sputtering en dos etapas. Al mismo tiempo, el sputtering en tres etapas causa menos da\u00f1os por radiaci\u00f3n al sustrato y puede utilizarse para fabricar pel\u00edculas finas para circuitos integrados y dispositivos semiconductores. Sin embargo, la estructura del dispositivo es m\u00e1s compleja que la de la descarga cat\u00f3dica en fr\u00edo, y es dif\u00edcil preparar un plasma con una gran \u00e1rea de cobertura y densidad uniforme, adem\u00e1s de que existen problemas como el consumo de filamento, por lo que este proceso de preparaci\u00f3n casi ha dejado de utilizarse en los \u00faltimos a\u00f1os.<\/p><p>La tecnolog\u00eda de pulverizaci\u00f3n de magnetr\u00f3n se encuentra en la superficie de destino de c\u00e1todo de pulverizaci\u00f3n secundaria para establecer un campo magn\u00e9tico cerrado en forma de anillo, que tiene un paralelo a la superficie de destino de la distribuci\u00f3n del campo magn\u00e9tico transversal, el campo magn\u00e9tico es generado por el cuerpo de destino del im\u00e1n, es actualmente una de las principales tecnolog\u00edas para el recubrimiento. La estructura del dispositivo de recubrimiento por pulverizaci\u00f3n cat\u00f3dica se aplica en el campo magn\u00e9tico del c\u00e1todo objetivo, el uso de los efectos f\u00edsicos del campo magn\u00e9tico en los electrones de uni\u00f3n y ampliar efectivamente la trayectoria de los electrones, lo que aumenta la tasa de colisi\u00f3n del electrodo y el \u00e1tomo de gas para mejorar la tasa de ionizaci\u00f3n del gas, de modo que los iones m\u00e1s energ\u00e9ticos bombardean el material objetivo. Seg\u00fan el principio del sputtering por magnetr\u00f3n, la clave de la tecnolog\u00eda de sputtering por magnetr\u00f3n es establecer una trampa de haz de electrones eficaz. El sputtering por magnetr\u00f3n es una tecnolog\u00eda de sputtering de alta velocidad y baja temperatura; su presi\u00f3n de gas de trabajo es de 0,1 Pa, la densidad de corriente del blanco puede alcanzar decenas de miliamperios, y la velocidad de deposici\u00f3n alcanza de varios cientos de nan\u00f3metros a 2000 nm por minuto.<\/p><p>En la actualidad, la tecnolog\u00eda de revestimiento por pulverizaci\u00f3n cat\u00f3dica de magnetr\u00f3n tiene una amplia gama de aplicaciones en la producci\u00f3n real, gracias a sus caracter\u00edsticas significativas, a saber, una amplia gama de ajuste din\u00e1mico de los par\u00e1metros de funcionamiento, la tasa de deposici\u00f3n de la pel\u00edcula y el espesor se pueden controlar f\u00e1cilmente; no hay problema de part\u00edculas de gotas en la capa de pel\u00edcula; una amplia gama de materiales de destino para elegir, casi todos los metales, aleaciones y materiales cer\u00e1micos se pueden utilizar; y el uso de electrodos de magnetr\u00f3n puede mejorar eficazmente la tasa de pulverizaci\u00f3n cat\u00f3dica. Por lo tanto, la velocidad de grabado por pulverizaci\u00f3n cat\u00f3dica en la superficie del blanco y la velocidad de deposici\u00f3n de la pel\u00edcula en la superficie del sustrato son muy altas. Al mismo tiempo, el sputtering por magnetr\u00f3n tiene la ventaja de que la temperatura del sustrato es baja. Sin embargo, el blanco de pulverizaci\u00f3n cat\u00f3dica por magnetr\u00f3n tradicional que utiliza un campo magn\u00e9tico desigual, el efecto de convergencia local del plasma dar\u00e1 lugar a un grabado desigual. Adem\u00e1s, el material de destino no puede tener una alta permeabilidad magn\u00e9tica, que son las desventajas de sputtering magnetr\u00f3n convencional.<\/p><p><strong>2. Pulverizaci\u00f3n cat\u00f3dica de materiales aislantes<\/strong><\/p><p>Desde el punto de vista de la estructura del dispositivo, el sputtering DC y el recubrimiento por sputtering magnetr\u00f3nico DC necesitan aplicar potenciales negativos sobre el blanco de sputtering, lo que requiere que el material del blanco sea un buen conductor, y no es aplicable a la preparaci\u00f3n de pel\u00edculas diel\u00e9ctricas aislantes. En este sentido, la tecnolog\u00eda de sputtering por RF puede utilizarse para sustituir la fuente de alimentaci\u00f3n del dispositivo de sputtering de CC por una fuente de alimentaci\u00f3n de RF. En el proceso de pulverizaci\u00f3n cat\u00f3dica, la polaridad de la fuente de alimentaci\u00f3n se cambia seg\u00fan el ciclo, y los iones y electrones positivos del plasma de RF entre el polo del blanco y el sustrato bombardean el blanco aislante alternativamente para producir la pulverizaci\u00f3n cat\u00f3dica.<\/p><p>El sputtering por RF evita una gran dispersi\u00f3n de \u00e1tomos y mejora la velocidad de deposici\u00f3n por sputtering. Al mismo tiempo, las part\u00edculas pulverizadas tienen menos p\u00e9rdida de energ\u00eda durante el vuelo y mayor energ\u00eda cuando alcanzan el sustrato, lo que favorece la mejora de la fuerza de adhesi\u00f3n y la densificaci\u00f3n de la capa de la pel\u00edcula. Al mismo tiempo, el bombardeo por RF reduce eficazmente la dependencia de la descarga de electrones secundarios y disminuye la tensi\u00f3n de ruptura, lo que permite bombardear cualquier material, incluidos los materiales diel\u00e9ctricos. Sin embargo, dado que la estructura del dispositivo del sputtering RF no difiere fundamentalmente de la del sputtering secundario, tambi\u00e9n existen inconvenientes como la baja velocidad de deposici\u00f3n, la alta temperatura del sustrato y la escasa uniformidad del sputtering.<\/p><p><strong>3. Pulverizaci\u00f3n cat\u00f3dica de pel\u00edcula fina compuesta<\/strong><\/p><p>El sputtering de aleaciones y compuestos difiere en gran medida del sputtering de s\u00f3lidos de un solo \u00e1tomo. Dado que los elementos que constituyen los s\u00f3lidos tienen rendimientos de sputtering diferentes entre s\u00ed, la preparaci\u00f3n de pel\u00edculas de compuestos puede llevarse a cabo mediante el m\u00e9todo de sputtering reactivo, adem\u00e1s del m\u00e9todo de sputtering por radiofrecuencia. Es decir, en el proceso de recubrimiento por sputtering, el gas de reacci\u00f3n introducido en una etapa posterior reacciona con el material objetivo sputtering y se deposita en la superficie del sustrato para obtener una pel\u00edcula delgada con una composici\u00f3n diferente a la del material objetivo. Las ventajas del sputtering reactivo son que el material objetivo y el gas reactivo pueden obtener f\u00e1cilmente una alta pureza, lo que favorece la preparaci\u00f3n de pel\u00edculas compuestas de alta pureza; la composici\u00f3n de la pel\u00edcula puede ajustarse artificialmente para regular las caracter\u00edsticas de la pel\u00edcula; en todo el proceso de deposici\u00f3n reactiva, el sustrato tiene un bajo aumento de temperatura, lo que puede utilizarse para preparar pel\u00edculas homog\u00e9neas de gran superficie y realizar una producci\u00f3n industrializada. Sin embargo, en la operaci\u00f3n real del proceso, la preparaci\u00f3n de blancos compuestos es dif\u00edcil, el proceso de sputtering reactivo DC es inestable, el proceso es dif\u00edcil de controlar f\u00e1cilmente causado por el envenenamiento del blanco, la fuente del blanco y la superficie del arco de fuego de la pieza de trabajo y otros fen\u00f3menos, estos problemas son serias limitaciones para el desarrollo y la promoci\u00f3n de la tecnolog\u00eda de sputtering reactivo.<\/p><p>Los fen\u00f3menos de envenenamiento del blanco, descarga del arco y desaparici\u00f3n del \u00e1nodo en el sputtering reactivo pueden resolverse cambiando la frecuencia de la fuente de alimentaci\u00f3n del blanco de sputtering. La fuente de alimentaci\u00f3n pulsada de frecuencia media se ha convertido gradualmente en un nuevo modo de fuente de alimentaci\u00f3n para el sputtering reactivo compuesto, y la frecuencia de esta fuente de alimentaci\u00f3n est\u00e1 entre CC y RF. En el proceso de sputtering de reacci\u00f3n por magnetr\u00f3n AC de frecuencia media, los dos blancos gemelos se alternan peri\u00f3dicamente como c\u00e1todo y \u00e1nodo bajo la acci\u00f3n de la corriente alterna (AC) suspendida, de modo que son sputtering en un round-robin c\u00edclico. La pel\u00edcula aislante preparada por el equipo de sputtering reactivo de frecuencia media est\u00e1 b\u00e1sicamente libre de part\u00edculas grandes en comparaci\u00f3n con el sputtering de corriente continua, y la capa de la pel\u00edcula es m\u00e1s densa. Adem\u00e1s, la alta velocidad de deposici\u00f3n, las condiciones de trabajo estables, el bajo coste de producci\u00f3n y la alta temperatura del sustrato durante el proceso de sputtering favorecen la mejora de la calidad de la pel\u00edcula y la fuerza de adherencia.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-4f8fdd3 elementor-widget elementor-widget-text-editor\" data-id=\"4f8fdd3\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Ofrecemos <a href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/que-es-el-deposicion-fisica-de-vapor-2\/\">Servicio de personalizaci\u00f3n de fundici\u00f3n por sputtering de magnetr\u00f3n<\/a>no dude en dejarnos un comentario.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f7b91e2 uael-mobile-wpf-button-justify uael-wpf-style-box uael-wpf-input-size-sm uael-wpf-button-left uael-wpf-btn-size-sm uael-wpf-highlight-style-default elementor-widget elementor-widget-uael-wpf-styler\" data-id=\"f7b91e2\" data-element_type=\"widget\" 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data-widget_type=\"uael-wpf-styler.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div class = \"uael-wpf-container\">\r\n\t\t\t\t\t\t<div class = \"uael-wpf uael-wpf-style elementor-clickable\">\r\n\t\t\t\t\t\t<div class=\"wpforms-container wpforms-container-full\" id=\"wpforms-2729\"><form id=\"wpforms-form-2729\" class=\"wpforms-validate wpforms-form wpforms-ajax-form\" data-formid=\"2729\" method=\"post\" enctype=\"multipart\/form-data\" action=\"\/es\/wp-json\/wp\/v2\/posts\/7571\" data-token=\"bc88c845ea429835182066c967aeb694\" data-trp-original-action=\"\/es\/wp-json\/wp\/v2\/posts\/7571\"><noscript class=\"wpforms-error-noscript\">Por favor, active JavaScript en su navegador para completar este formulario.<\/noscript><div class=\"wpforms-field-container\"><div id=\"wpforms-2729-field_5-container\" class=\"wpforms-field wpforms-field-textarea\" data-field-id=\"5\"><label class=\"wpforms-field-label\" for=\"wpforms-2729-field_5\">Necesidad (Demanda) 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href=\"https:\/\/www.nanofab.com.cn\/wp-content\/plugins\/elementor-pro\/assets\/css\/widget-posts.min.css\">\t\t<div class=\"elementor-posts-container elementor-posts elementor-posts--skin-classic elementor-grid\">\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7386 page type-page status-publish has-post-thumbnail hentry category-process tag-process\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/deposicion-de-capas-atomicas-procesamiento-de-contratos-2\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img decoding=\"async\" width=\"300\" height=\"195\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8-300x195.png\" class=\"attachment-medium size-medium wp-image-7388\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8-300x195.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8-18x12.png 18w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8.png 640w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/deposicion-de-capas-atomicas-procesamiento-de-contratos-2\/\" >\n\t\t\t\tProcesado de sustituci\u00f3n por deposici\u00f3n de capas at\u00f3micas (ALD)\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/deposicion-de-capas-atomicas-procesamiento-de-contratos-2\/\" aria-label=\"M\u00e1s informaci\u00f3n sobre Deposici\u00f3n en capas at\u00f3micas (ALD) Subcontrataci\u00f3n\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7344 page type-page status-publish has-post-thumbnail hentry category-process tag-process\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/deposicion-quimica-de-vapor-2\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"200\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-300x200.png\" class=\"attachment-medium size-medium wp-image-7347\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-300x200.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-1024x684.png 1024w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-768x513.png 768w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-1536x1025.png 1536w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-18x12.png 18w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/elementor\/thumbs\/f394ed96-eaca-40cc-83f6-ebadaea95553-qlt2nzpy27w47wpv9hvjdczv85dnqtqc8q83uvppb4.png 360w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553.png 1600w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/deposicion-quimica-de-vapor-2\/\" >\n\t\t\t\tProcesado por deposici\u00f3n qu\u00edmica en fase vapor (CVD)\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/deposicion-quimica-de-vapor-2\/\" aria-label=\"M\u00e1s informaci\u00f3n sobre Deposici\u00f3n qu\u00edmica en fase vapor (CVD) Subcontrataci\u00f3n\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7355 page type-page status-publish has-post-thumbnail hentry category-process tag-process\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/que-es-el-deposicion-fisica-de-vapor-2\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"200\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-300x200.png\" class=\"attachment-medium size-medium wp-image-7357\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-300x200.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-1024x683.png 1024w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-768x512.png 768w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-18x12.png 18w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/elementor\/thumbs\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-qlti2lfsi53oh54jrq611wpt5lt6dogutrcqlbec0w.png 360w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932.png 1508w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/que-es-el-deposicion-fisica-de-vapor-2\/\" >\n\t\t\t\tProcesado por deposici\u00f3n f\u00edsica en fase vapor (PVD)\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/es\/servicios-personalizados-2\/tecnologia-de-revestimiento-laminacion-de-pelicula-fina-2\/que-es-el-deposicion-fisica-de-vapor-2\/\" aria-label=\"M\u00e1s informaci\u00f3n sobre la subcontrataci\u00f3n del dep\u00f3sito f\u00edsico en fase vapor (PVD)\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<\/div>\n\t\t\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-48bafa1 elementor-widget-divider--view-line elementor-widget elementor-widget-divider\" data-id=\"48bafa1\" data-element_type=\"widget\" data-widget_type=\"divider.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 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100%;-webkit-mask-repeat:var(--divider-pattern-repeat);mask-repeat:var(--divider-pattern-repeat);background-color:var(--divider-color);-webkit-mask-image:var(--divider-pattern-url);mask-image:var(--divider-pattern-url)}.elementor-widget-divider--no-spacing{--divider-pattern-size:auto}.elementor-widget-divider--bg-round{--divider-pattern-repeat:round}.rtl .elementor-widget-divider .elementor-divider__text{direction:rtl}.e-con-inner>.elementor-widget-divider,.e-con>.elementor-widget-divider{width:var(--container-widget-width,100%);--flex-grow:var(--container-widget-flex-grow)}<\/style>\t\t<div class=\"elementor-divider\">\n\t\t\t<span class=\"elementor-divider-separator\">\n\t\t\t\t\t\t<\/span>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-dfc2daf elementor-widget elementor-widget-heading\" data-id=\"dfc2daf\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<div class=\"elementor-heading-title elementor-size-default\">Lecturas relacionadas<\/div>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-eea4c0f elementor-grid-1 elementor-posts--thumbnail-none elementor-grid-tablet-2 elementor-grid-mobile-1 elementor-widget elementor-widget-posts\" data-id=\"eea4c0f\" data-element_type=\"widget\" data-settings=\"{&quot;classic_columns&quot;:&quot;1&quot;,&quot;classic_columns_tablet&quot;:&quot;2&quot;,&quot;classic_columns_mobile&quot;:&quot;1&quot;,&quot;classic_row_gap&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:35,&quot;sizes&quot;:[]},&quot;classic_row_gap_tablet&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]},&quot;classic_row_gap_mobile&quot;:{&quot;unit&quot;:&quot;px&quot;,&quot;size&quot;:&quot;&quot;,&quot;sizes&quot;:[]}}\" data-widget_type=\"posts.classic\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<div class=\"elementor-posts-container elementor-posts elementor-posts--skin-classic elementor-grid\">\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7816 post type-post status-publish format-standard has-post-thumbnail hentry category-application\">\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/caracteristicas-y-aplicaciones-del-magnetron-sputtering-para-preparar-dioxido-de-vanadio-2\/\" >\n\t\t\t\tCaracter\u00edsticas y aplicaciones del di\u00f3xido de vanadio preparado mediante pulverizaci\u00f3n cat\u00f3dica por magnetr\u00f3n\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t<p>Caracter\u00edsticas y aplicaciones del di\u00f3xido de vanadio preparado por pulverizaci\u00f3n cat\u00f3dica por magnetr\u00f3n M\u00e9todo de pulverizaci\u00f3n cat\u00f3dica por magnetr\u00f3n<\/p>\n\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/caracteristicas-y-aplicaciones-del-magnetron-sputtering-para-preparar-dioxido-de-vanadio-2\/\" aria-label=\"Leer m\u00e1s sobre \u00bfCu\u00e1les son las caracter\u00edsticas y aplicaciones del di\u00f3xido de vanadio preparado mediante pulverizaci\u00f3n cat\u00f3dica por magnetr\u00f3n?\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7731 post type-post status-publish format-standard has-post-thumbnail hentry category-application\">\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/factores-que-influyen-en-la-tasa-de-crecimiento-de-las-peliculas-de-polisilicio\/\" >\n\t\t\t\tExploraci\u00f3n en 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href=\"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/aplicacion-de-la-pelicula-delgada-de-nitruro-de-silicio-en-el-campo-optico\/\" >\n\t\t\t\tPel\u00edculas finas de nitruro de silicio (SiNx) para aplicaciones \u00f3pticas\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t<p>Pel\u00edculas de nitruro de silicio en \u00f3ptica Las pel\u00edculas de nitruro de silicio como can\u00f3nica<\/p>\n\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/es\/vision-2\/application\/aplicacion-de-la-pelicula-delgada-de-nitruro-de-silicio-en-el-campo-optico\/\" aria-label=\"Leer m\u00e1s sobre Pel\u00edculas finas de nitruro de silicio (SiNx) para aplicaciones \u00f3pticas\" tabindex=\"-1\" >\n\t\t\tLeer M\u00e1s \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<\/div>\n\t\t\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ecd583b elementor-widget elementor-widget-heading\" data-id=\"ecd583b\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<p class=\"elementor-heading-title elementor-size-default\"><a href=\"https:\/\/www.nanofab.com.cn\/es\/perspectivas-2\/\">M\u00e1s relacionados...<\/a><\/p>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<\/div>","protected":false},"excerpt":{"rendered":"<p>\u00bfCu\u00e1les son los factores que influyen en el proceso de recubrimiento por pulverizaci\u00f3n cat\u00f3dica de materiales de pel\u00edcula fina? Al bombardear una superficie s\u00f3lida con part\u00edculas energ\u00e9ticas (normalmente iones positivos acelerados por un campo el\u00e9ctrico), los \u00e1tomos de la superficie s\u00f3lida [...]<\/p>","protected":false},"author":3,"featured_media":7572,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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