{"id":7744,"date":"2024-04-18T17:37:37","date_gmt":"2024-04-18T09:37:37","guid":{"rendered":"https:\/\/www.nanofab.com.cn\/?p=7744"},"modified":"2024-05-13T10:22:18","modified_gmt":"2024-05-13T02:22:18","slug":"factors-influencing-the-surface-properties-of-polysilicon-films","status":"publish","type":"post","link":"https:\/\/www.nanofab.com.cn\/en\/insight-2\/application\/factors-influencing-the-surface-properties-of-polysilicon-films-2\/","title":{"rendered":"Polysilicon film\u4e28Various factors affecting the surface properties of polysilicon film"},"content":{"rendered":"<div data-elementor-type=\"wp-post\" data-elementor-id=\"7744\" class=\"elementor elementor-7744\" data-elementor-post-type=\"post\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-99c8d7d elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"99c8d7d\" data-element_type=\"section\" data-settings=\"{&quot;jet_parallax_layout_list&quot;:[]}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-c094855\" data-id=\"c094855\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-inner-section elementor-element elementor-element-e32e3d7 elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"e32e3d7\" data-element_type=\"section\" data-settings=\"{&quot;jet_parallax_layout_list&quot;:[]}\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-no\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-inner-column elementor-element elementor-element-e5eeed8\" data-id=\"e5eeed8\" data-element_type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-b07ae16 elementor-widget elementor-widget-heading\" data-id=\"b07ae16\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 *\/\n.elementor-heading-title{padding:0;margin:0;line-height:1}.elementor-widget-heading .elementor-heading-title[class*=elementor-size-]>a{color:inherit;font-size:inherit;line-height:inherit}.elementor-widget-heading .elementor-heading-title.elementor-size-small{font-size:15px}.elementor-widget-heading .elementor-heading-title.elementor-size-medium{font-size:19px}.elementor-widget-heading .elementor-heading-title.elementor-size-large{font-size:29px}.elementor-widget-heading .elementor-heading-title.elementor-size-xl{font-size:39px}.elementor-widget-heading .elementor-heading-title.elementor-size-xxl{font-size:59px}<\/style><h1 class=\"elementor-heading-title elementor-size-default\">Polycrystalline Silicon Film\u4e28Various Factors Affecting Surface Properties<\/h1>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f8f1cd5 elementor-widget elementor-widget-post-info\" data-id=\"f8f1cd5\" data-element_type=\"widget\" data-widget_type=\"post-info.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<link rel=\"stylesheet\" href=\"https:\/\/www.nanofab.com.cn\/wp-content\/plugins\/elementor\/assets\/css\/widget-icon-list.min.css\"><link rel=\"stylesheet\" href=\"https:\/\/www.nanofab.com.cn\/wp-content\/plugins\/elementor-pro\/assets\/css\/widget-theme-elements.min.css\">\t\t<ul class=\"elementor-icon-list-items elementor-post-info\">\n\t\t\t\t\t\t\t\t<li class=\"elementor-icon-list-item elementor-repeater-item-577f4c4\" itemprop=\"datePublished\">\n\t\t\t\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/en\/2024\/04\/18\/\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t<span class=\"elementor-icon-list-text elementor-post-info__item elementor-post-info__item--type-date\">\n\t\t\t\t\t\t\t\t\t\t<time>2024-04-18<\/time>\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t<\/a>\n\t\t\t\t<\/li>\n\t\t\t\t<\/ul>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f340fb7 elementor-widget elementor-widget-image\" data-id=\"f340fb7\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 *\/\n.elementor-widget-image{text-align:center}.elementor-widget-image a{display:inline-block}.elementor-widget-image a img[src$=\".svg\"]{width:48px}.elementor-widget-image img{vertical-align:middle;display:inline-block}<\/style>\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"683\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-1024x683.png\" class=\"attachment-large size-large wp-image-7746\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-1024x683.png 1024w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-300x200.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-768x512.png 768w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-1536x1024.png 1536w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-2048x1365.png 2048w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/04\/0c91e769390a9353bfcb3f51096116a-18x12.png 18w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-49ba868 elementor-widget elementor-widget-text-editor\" data-id=\"49ba868\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<style>\/*! elementor - v3.20.0 - 20-03-2024 *\/\n.elementor-widget-text-editor.elementor-drop-cap-view-stacked .elementor-drop-cap{background-color:#69727d;color:#fff}.elementor-widget-text-editor.elementor-drop-cap-view-framed .elementor-drop-cap{color:#69727d;border:3px solid;background-color:transparent}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap{margin-top:8px}.elementor-widget-text-editor:not(.elementor-drop-cap-view-default) .elementor-drop-cap-letter{width:1em;height:1em}.elementor-widget-text-editor .elementor-drop-cap{float:left;text-align:center;line-height:1;font-size:50px}.elementor-widget-text-editor .elementor-drop-cap-letter{display:inline-block}<\/style>\t\t\t\t<p>Growth of polysilicon thin films have many methods, according to the preparation process can be divided into two categories, namely, direct preparation methods and indirect preparation methods. Direct preparation method is directly deposited on the substrate of polysilicon film, such as liquid phase growth method, chemical vapor deposition method, plasma chemical vapor deposition method, liquid-phase epitaxial method, etc.; Indirect preparation method is the first preparation of amorphous thin film materials on the substrate, and then solid-phase characterization of polysilicon film.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-3841510 elementor-widget elementor-widget-heading\" data-id=\"3841510\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Reasons affecting the surface properties of polysilicon thin films<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-426ca33 elementor-widget elementor-widget-text-editor\" data-id=\"426ca33\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2>Effect of deposition temperature on the surface properties of polycrystalline silicon thin films<\/h2>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-ec0d8a9 elementor-widget elementor-widget-text-editor\" data-id=\"ec0d8a9\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>From the thermodynamic principle can be seen, the reactant molecules arrive at the substrate wafer surface, will occur mutual collision and nucleation on the surface of the wafer. With the deposition temperature increases, the critical nucleus radius required to form a stable nucleus will become larger, i.e., more atoms are needed to stabilize the critical nucleus, and the formed grains will be larger. In addition, silicon atoms need to overcome certain barriers to continuous growth, deposition temperature is higher, the mobility of atoms will become larger, the kinetic energy increases, the interface energy of the grain will be reduced, prompting the combination of diffusion between the grains, the film is easy to grow into a larger size of the island-like structure.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6302019 elementor-widget elementor-widget-text-editor\" data-id=\"6302019\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2>Effect of deposition time on the surface properties of polycrystalline silicon thin films<\/h2>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-b45d707 elementor-widget elementor-widget-text-editor\" data-id=\"b45d707\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>Deposition time has a great influence on the nucleation and growth of grains. The grain size varies with less deposition time and increases with increasing deposition time. The growth of grains can be considered as the formation of some atoms by self-diffusion through the intergranular boundaries of the grains, which are more inclined to minimize their area because of the interfacial energy. With the increase of deposition time, there is enough time for migration between the grains to occur and make the grain size larger.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d1206c0 elementor-widget elementor-widget-text-editor\" data-id=\"d1206c0\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2>Effect of annealing temperature on the surface properties of polycrystalline silicon thin films<\/h2>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-89c815d elementor-widget elementor-widget-text-editor\" data-id=\"89c815d\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>The large increase in surface grain size after annealing is due to the fact that annealing gives atoms more free energy and promotes migration of atoms, resulting in agglomeration between atoms and recrystallization of grains. The changes in surface roughness at different annealing temperatures may be due to the further growth of the grains after the annealing temperature is increased so that the interface between the grains is reduced and the variability between some of the grains is reduced.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9c14fab elementor-widget elementor-widget-heading\" data-id=\"9c14fab\" data-element_type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">Reasons affecting thickness uniformity of polysilicon films<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f0ec10d elementor-widget elementor-widget-text-editor\" data-id=\"f0ec10d\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2>Effect of deposition temperature on thickness uniformity of polycrystalline silicon films<\/h2>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f132f19 elementor-widget elementor-widget-text-editor\" data-id=\"f132f19\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>The degree uniformity of the film decreases with increasing temperature. The reason for this phenomenon may be due to the difference in air flow between the center and edge positions, the reactant molecules preferentially reach and nucleate at the edge of the wafer, and the growth rate of the film is significantly accelerated at higher temperatures. As a result, the variability of growth at the edge relative to the center is more pronounced.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9d38c17 elementor-widget elementor-widget-text-editor\" data-id=\"9d38c17\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2>Effect of reaction pressure on thickness uniformity of polysilicon films<\/h2>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-dbb0430 elementor-widget elementor-widget-text-editor\" data-id=\"dbb0430\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>The thickness uniformity of the film decreases slightly with increasing pressure. The reason for this phenomenon may be due to the difference in the air flow rate between the center and the edge position, the reactant molecules preferentially reach the edge of the wafer and nucleate, and the growth rate of the film increases due to the increase in pressure, so the growth of the edge relative to the center shows a certain degree of variability, but the variability is also smaller because the pressure's effect on the growth rate of the film is much smaller relative to the temperature.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-d6b5507 elementor-widget elementor-widget-text-editor\" data-id=\"d6b5507\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<h2>Effect of silane flux on thickness uniformity of polysilicon films<\/h2>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-7648100 elementor-widget elementor-widget-text-editor\" data-id=\"7648100\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>The thickness uniformity of the polysilicon film is essentially unchanged with the silane flow rate. It indicates that the molecular profile of the reactants reaching the center and edge regions of the wafer is essentially the same with increasing flow rate.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-008bbbf elementor-widget elementor-widget-text-editor\" data-id=\"008bbbf\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>1, with the deposition temperature increases, the growth rate of the film becomes larger, basically linear change, the growth rate is very sensitive to changes in temperature.<\/p><p>2, in the case of SiH4 flow rate and reaction pressure is small, with the increase of silane flow rate and reaction pressure, the growth rate of the film increases faster, basically linear change, when the SiH4 flow rate and reaction pressure continue to increase, the incremental change of the growth rate decreases. Both have a much smaller effect on the film growth rate relative to the deposition temperature.<\/p><p>3, the growth rate of the film basically does not change with the increase in deposition time. The reproducibility of film growth is very good, which can provide a basis for the growth of films of controllable thickness.<\/p><p>4, when the deposition temperature of 630 \u2103, reaction pressure of 0.25 torr, flow rate of 360sccm for the more ideal deposition conditions, the uniformity of the deposited film and surface properties are better.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-18e7fa8 elementor-widget elementor-widget-text-editor\" data-id=\"18e7fa8\" data-element_type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<p>We offer <a href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/chemical-vapor-deposition-2\/\">Chemical Vapor Deposition (CVD) OEM Customization Services<\/a>, Feel free to leave a message to inquire.<\/p>\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div 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href=\"https:\/\/www.nanofab.com.cn\/wp-content\/plugins\/elementor-pro\/assets\/css\/widget-posts.min.css\">\t\t<div class=\"elementor-posts-container elementor-posts elementor-posts--skin-classic elementor-grid\">\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7386 page type-page status-publish has-post-thumbnail hentry category-process tag-process\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/atomic-layer-deposition-contract-processing-2\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img decoding=\"async\" width=\"300\" height=\"195\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8-300x195.png\" class=\"attachment-medium size-medium wp-image-7388\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8-300x195.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8-18x12.png 18w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/2890e32db03fae1fa2ab67a6ed9c0d8.png 640w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/atomic-layer-deposition-contract-processing-2\/\" >\n\t\t\t\tAtomic Layer Deposition (ALD) Foundry Processing\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/atomic-layer-deposition-contract-processing-2\/\" aria-label=\"Read more about Atomic Layer Deposition (ALD) Foundry Processing\" tabindex=\"-1\" >\n\t\t\tRead More \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7344 page type-page status-publish has-post-thumbnail hentry category-process tag-process\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/chemical-vapor-deposition-2\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"200\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-300x200.png\" class=\"attachment-medium size-medium wp-image-7347\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-300x200.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-1024x684.png 1024w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-768x513.png 768w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-1536x1025.png 1536w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553-18x12.png 18w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/elementor\/thumbs\/f394ed96-eaca-40cc-83f6-ebadaea95553-qlt2nzpy27w47wpv9hvjdczv85dnqtqc8q83uvppb4.png 360w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/f394ed96-eaca-40cc-83f6-ebadaea95553.png 1600w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/chemical-vapor-deposition-2\/\" >\n\t\t\t\tChemical Vapor Deposition (CVD) Subcontracting\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/chemical-vapor-deposition-2\/\" aria-label=\"Read more about Chemical Vapor Deposition (CVD) Foundry Processing\" tabindex=\"-1\" >\n\t\t\tRead More \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<article class=\"elementor-post elementor-grid-item post-7355 page type-page status-publish has-post-thumbnail hentry category-process tag-process\">\n\t\t\t\t<a class=\"elementor-post__thumbnail__link\" href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/what-is-physical-vapor-deposition-2\/\" tabindex=\"-1\" >\n\t\t\t<div class=\"elementor-post__thumbnail\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"200\" src=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-300x200.png\" class=\"attachment-medium size-medium wp-image-7357\" alt=\"\" srcset=\"https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-300x200.png 300w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-1024x683.png 1024w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-768x512.png 768w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-18x12.png 18w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/elementor\/thumbs\/59c77cbc-ce7b-4fe7-99ce-ee924312b932-qlti2lfsi53oh54jrq611wpt5lt6dogutrcqlbec0w.png 360w, https:\/\/www.nanofab.com.cn\/wp-content\/uploads\/2024\/03\/59c77cbc-ce7b-4fe7-99ce-ee924312b932.png 1508w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/div>\n\t\t<\/a>\n\t\t\t\t<div class=\"elementor-post__text\">\n\t\t\t\t<h4 class=\"elementor-post__title\">\n\t\t\t<a href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/what-is-physical-vapor-deposition-2\/\" >\n\t\t\t\tPhysical Vapor Deposition (PVD) Subcontracting\t\t\t<\/a>\n\t\t<\/h4>\n\t\t\t\t<div class=\"elementor-post__excerpt\">\n\t\t\t\t\t<\/div>\n\t\t\n\t\t<a class=\"elementor-post__read-more\" href=\"https:\/\/www.nanofab.com.cn\/en\/customized-services\/coating-technology-thin-film-lamination-2\/what-is-physical-vapor-deposition-2\/\" aria-label=\"Read more about Physical Vapor Deposition (PVD) Subcontracting\" tabindex=\"-1\" >\n\t\t\tRead More \"\t\t<\/a>\n\n\t\t\t\t<\/div>\n\t\t\t\t<\/article>\n\t\t\t\t<\/div>\n\t\t\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1847818 elementor-widget-divider--view-line elementor-widget elementor-widget-divider\" data-id=\"1847818\" 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