1.0Harbor-Halbleiterhttps://www.nanofab.com.cn/derich600338<blockquote class="wp-embedded-content" data-secret="VIP1XsjnVe"><a href="https://www.nanofab.com.cn/de/einblick-2/application/mehr-uber-das-magnetronsputtern-erfahren/">Einfluss des Magnetron-Sputterns auf die Qualität von Dünnschichten</a></blockquote><iframe sandbox="allow-scripts" security="restricted" src="https://www.nanofab.com.cn/de/einblick-2/application/mehr-uber-das-magnetronsputtern-erfahren/embed/#?secret=VIP1XsjnVe" width="600" height="338" title="„磁控溅射丨影响薄膜质量的原因“ – 港湾半导体 " data-secret="VIP1XsjnVe" frameborder="0" marginwidth="0" marginheight="0" scrolling="no" class="wp-embedded-content"></iframe><script> /*! This file is auto-generated */ !function(d,l){"use strict";l.querySelector&&d.addEventListener&&"undefined"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!/[^a-zA-Z0-9]/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret="'+t.secret+'"]'),o=l.querySelectorAll('blockquote[data-secret="'+t.secret+'"]'),c=new RegExp("^https?:$","i"),i=0;i<o.length;i++)o[i].style.display="none";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute("style"),"height"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):"link"===t.message&&(r=new URL(s.getAttribute("src")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener("message",d.wp.receiveEmbedMessage,!1),l.addEventListener("DOMContentLoaded",function(){for(var e,t,s=l.querySelectorAll("iframe.wp-embedded-content"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute("data-secret"))||(t=Math.random().toString(36).substring(2,12),e.src+="#?secret="+t,e.setAttribute("data-secret",t)),e.contentWindow.postMessage({message:"ready",secret:t},"*")},!1)))}(window,document); //# sourceURL=https://www.nanofab.com.cn/wp-includes/js/wp-embed.min.js </script>https://www.nanofab.com.cn/wp-content/uploads/2024/04/2d15739bf0a5e9ed9318664d145f9d4.png626417磁控溅射沉积在经历了一个有争议的开始之后，因为覆盖金属膜的高沉积速率在 20 世纪 70 年代末和 80 年代初迅速发展起来，此后一直是等离子溅射沉积的主力军。磁控溅射沉积技术也是目前应用最广泛的薄膜沉积和表面工程处理工艺。